- 专利标题: Shower head of combinatorial spatial atomic layer deposition apparatus
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申请号: US15014568申请日: 2016-02-03
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公开(公告)号: US10815569B2公开(公告)日: 2020-10-27
- 发明人: Xianyu Wenxu , Yongsung Kim , Jaikwang Shin , Wooyoung Yang
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4ab28d60
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; C23C16/44 ; C40B60/00
摘要:
A shower head of a combinatorial spatial atomic layer deposition (CS-ALD) apparatus may be provided. The shower head of the CS-ALD apparatus may include a plurality of shower blocks. Each of shower blocks may include a plurality of unit modules. Each of the shower blocks and each of the unit modules may be controlled independently from each other. Each of the plurality of unit modules may include a source gas injection nozzle, a purge gas injection nozzle, a reactant gas injection nozzle, and exhaust areas between the injection nozzles. The plurality of shower blocks may be separated from each other. Gas injection areas of the injection nozzles may be separated from the exhaust area.
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