Invention Grant
- Patent Title: Electronic material filler, high-frequency substrate, and electronic material slurry
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Application No.: US16715204Application Date: 2019-12-16
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Publication No.: US10851246B2Publication Date: 2020-12-01
- Inventor: Yusuke Watanabe , Nobutaka Tomita , Yoshiaki Kato
- Applicant: ADMATECHS CO., LTD.
- Applicant Address: JP Miyoshi
- Assignee: ADMATECHS CO., LTD.
- Current Assignee: ADMATECHS CO., LTD.
- Current Assignee Address: JP Miyoshi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2018-235932 20181217
- Main IPC: C09C3/12
- IPC: C09C3/12 ; C01B33/18 ; C08J3/205 ; C08K9/06 ; C08J3/20

Abstract:
A production method for an electronic material filler includes: a preparation step of preparing a silica particle material produced by a dry method; and a first surface treatment step of performing surface treatment on the silica particle material with a silane compound having a vinyl group, a phenyl group, a phenylamino group, an alkyl group having four or more carbon atoms, a methacryl group, or an epoxy group, to obtain a first surface treatment-processed particle material. After the silica particle material is produced by the dry method, the silica particle material is not brought into contact with liquid water, and has a particle diameter of 100 nm to 600 nm or a specific surface area of 5 m2/g to 35 m2/g.
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