Invention Grant
- Patent Title: Semiconductor device
-
Application No.: US16563670Application Date: 2019-09-06
-
Publication No.: US10854710B2Publication Date: 2020-12-01
- Inventor: Hidetoshi Tanaka
- Applicant: SOCIONEXT, INC.
- Applicant Address: JP Kanagawa
- Assignee: SOCIONEXT, INC.
- Current Assignee: SOCIONEXT, INC.
- Current Assignee Address: JP Kanagawa
- Agency: McDermott Will & Emery LLP
- Priority: JP2017-100704 20170522
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L27/088 ; H01L27/02 ; H01L29/775

Abstract:
A semiconductor device includes a first transistor formed on a substrate and including first and second impurity regions, a second transistor formed on the substrate and including a third impurity region electrically connected to the second impurity region, and a fourth impurity region, a power supply terminal electrically connected to the first impurity region, a ground terminal electrically connected to the fourth impurity region, a first guard ring surrounding the first transistor in a plan view and electrically connected to the ground terminal, and a second guard ring surrounding the second transistor in a plan view and electrically connected to the ground terminal. A conductivity type of the first through fourth impurity regions is different from a conductivity type of the first and second guard rings. The second guard ring has a width narrower than a width of the first guard ring in a plan view.
Public/Granted literature
- US20190393302A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-12-26
Information query
IPC分类: