Invention Grant
- Patent Title: Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
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Application No.: US14738543Application Date: 2015-06-12
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Publication No.: US10859921B2Publication Date: 2020-12-08
- Inventor: Jun-Ho Sim , Sang-Hyun Yun , Hi-Kuk Lee , Hyun-Seok Kim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2014-0130501 20140929
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; H01L23/544

Abstract:
A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.
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