Invention Grant
- Patent Title: Gas diffuser mounting plate for reduced particle generation
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Application No.: US16201755Application Date: 2018-11-27
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Publication No.: US10883174B2Publication Date: 2021-01-05
- Inventor: Allen K. Lau , Hsiang An , Lai Zhao , Jianhua Zhou , Robin L. Tiner
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/50 ; H01J37/32

Abstract:
Embodiments of the present disclosure generally provide apparatus and methods for a gas diffuser assembly for a vacuum chamber, the gas diffuser assembly comprising a mounting plate, the mounting plate comprising a hub, a plurality of curved spokes extending from the hub in a radial direction, a gusset portion coupled between the hub and each of the curved spokes, each of the gusset portions having a convex curve disposed in an axial direction, and one or more mounting holes coupled to the curved spokes.
Public/Granted literature
- US20200165726A1 GAS DIFFUSER MOUNTING PLATE FOR REDUCED PARTICLE GENERATION Public/Granted day:2020-05-28
Information query
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