A method for manufacturing an amino group-containing organosilicon compound of the following formula (1): wherein each R1 independently represents an alkyl group having 1 to 10 carbon atoms, etc., each of R2 and R3 represents a functional group of the following formula (4), etc., m represents an integer of 1 to 3, and n represents an integer of 1 to 12, wherein an asterisk * represents a bond with an adjacent atom, p represents an integer of 1 to 12, and q represents an integer of 1 to 10, the method comprising: (A) reacting an amine compound of the following formula (2): wherein R2 and R3 mean the same as above with a halogen group-containing organosilicon compound of the following formula (3): wherein X represents a chlorine atom, etc., and R1 and n mean the same as above; (B) removing an amine hydrohalide produced in the step (A), by liquid-liquid separation; and (C) neutralizing an organic layer obtained in the step (B), using a base which amounts 0.1 to 0.95 mol equivalent, relative to a halide ion contained in the organic layer.