- 专利标题: Metallic foil manufacturing method and cathode for manufacturing metallic foil
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申请号: US16328509申请日: 2017-10-30
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公开(公告)号: US10900138B2公开(公告)日: 2021-01-26
- 发明人: Junichi Matsuda , Atsushi Okamoto
- 申请人: HITACHI METALS, LTD.
- 申请人地址: JP Tokyo
- 专利权人: HITACHI METALS, LTD.
- 当前专利权人: HITACHI METALS, LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2017-010982 20170125
- 国际申请: PCT/JP2017/039050 WO 20171030
- 国际公布: WO2018/138989 WO 20180802
- 主分类号: C25D1/20
- IPC分类号: C25D1/20 ; C25D1/04 ; C23C8/02 ; C23C8/10 ; C25D11/26
摘要:
Provided are a metallic foil manufacturing method in which a metallic film electrodeposited by electrolysis on the surface of an electrodeposition surface of a cathode is peeled off to form a metallic foil, and the electrodeposition surface used therein is obtained by subjecting a roughened surface, which results from roughening a smoothed surface made of titanium or titanium alloy using a blast treatment, etc., to an oxidation treatment selected from thermal oxidation, anodic oxidation (preferably anodic oxidation carried out while moving the anodic oxidation solution), or a combination treatment of thermal oxidation and anodic oxidation so that the electrodeposition surface has an oxidation layer with a thickness of 30 to 250 nm on the uppermost layer and has a surface roughness RZJIS of 4 to 10 μm.
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