发明授权
- 专利标题: Resistive memory device and method of manufacturing the resistive memory device
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申请号: US16909663申请日: 2020-06-23
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公开(公告)号: US10903419B2公开(公告)日: 2021-01-26
- 发明人: Hyuck Sang Yim , Myung Sun Song
- 申请人: SK hynix Inc.
- 申请人地址: KR Icheon-si
- 专利权人: SK hynix Inc.
- 当前专利权人: SK hynix Inc.
- 当前专利权人地址: KR Icheon-si
- 代理机构: William Park & Associates Ltd.
- 优先权: KR10-2018-0051792 20180504
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L27/24 ; G11C7/18 ; G11C8/14 ; G11C13/00
摘要:
A resistive memory device may include a plurality of MATs, row control blocks, a plurality of word lines, a plurality of bit lines and memory cells. Each of the row control blocks may be interposed between the MATs. Each of the row control blocks may include a control element. The word lines may be arranged spaced apart from each other by a substantially uniform gap on the MATs. The bit lines may overlap with the word lines. The memory cells may be located between the word lines and the bit lines. Each of the word lines may be electrically connected with the control element of each of the row control blocks via a connection path.
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