Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US15779758Application Date: 2016-11-17
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Publication No.: US10915033B2Publication Date: 2021-02-09
- Inventor: Bram Van Hoof , Jeroen Cottaar
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne Kessler Goldstein & Fox P.L.L.C
- Priority: EP15200110 20151215
- International Application: PCT/EP2016/078023 WO 20161117
- International Announcement: WO2017/102237 WO 20170622
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20

Abstract:
Combination of a stage and a level sensor configured to sense a height level at a target location on an object is described, the stage comprising an object table configured to hold the object and a positioning device for displacing the object table relative to the level sensor in a first direction, the level sensor comprising a projection system configured to project a measurement beam onto a measurement area of the object, the measurement area having a measurement area length in the first direction, a detector system configured to receive different portions of the measurement beam after being reflected off different sub-areas within the measurement area, the different sub-areas being arranged in the first direction, and to supply output signals representative of the different portions received, a signal processing system configured to process the output signals from the detector system.
Public/Granted literature
- US20200326637A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2020-10-15
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