- 专利标题： Surface-fluorinated silicon-containing electrodes
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申请号： US16430298申请日： 2019-06-03
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公开(公告)号： US10916763B2公开(公告)日： 2021-02-09
- 发明人: Liwen Ji , Benjamin Yong Park , Robert A. Rango , Dong Sun , Frederic C. Bonhomme
- 申请人： Enevate Corporation
- 申请人地址： US CA Irvine
- 专利权人： Enevate Corporation
- 当前专利权人： Enevate Corporation
- 当前专利权人地址： US CA Irvine
- 代理机构： McAndrews, Held & Malloy
- 主分类号： H01M4/134
- IPC分类号： H01M4/134 ; H01M4/36 ; H01M4/04 ; H01M4/02
摘要：
The present application describes the use of a solid electrolyte interphase (SEI) fluorinating precursor and/or an SEI fluorinating compound to coat an electrode material and create an artificial SEI layer. These modifications may increase surface passivation of the electrodes, SEI robustness, and structural stability of the silicon-containing electrodes.
公开/授权文献
- US20200381707A1 SURFACE-FLUORINATED SILICON-CONTAINING ELECTRODES 公开/授权日：2020-12-03
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