Invention Grant
- Patent Title: Array substrate, preparation method thereof, and display device
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Application No.: US15956465Application Date: 2018-04-18
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Publication No.: US10923512B2Publication Date: 2021-02-16
- Inventor: Qingzhao Liu , Jiushi Wang , Da Lu
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: McDermott Will & Emery LLP
- Priority: CN201710674709 20170809
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/40 ; H01L21/3215 ; H01L27/092 ; H01L29/06 ; H01L29/423

Abstract:
The embodiments of the present disclosure provide an array substrate, a preparation method thereof, and a display device. The preparation method of an array substrate comprises: forming the active layer, a gate insulating layer, the gate metal layer and the patterned photoresist sequentially on a substrate; forming a gate electrode transition pattern by etching a gate metal layer via a patterned photoresist, using a wet etching process and a dry etching process sequentially; and doping an area of the active layer not sheltered by the gate electrode transition pattern with ions to form a heavily doped area of the active layer.
Public/Granted literature
- US20190051677A1 ARRAY SUBSTRATE, PREPARATION METHOD THEREOF, AND DISPLAY DEVICE Public/Granted day:2019-02-14
Information query
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