Invention Grant
- Patent Title: Method and apparatus for estimating disparity
-
Application No.: US15975808Application Date: 2018-05-10
-
Publication No.: US10929998B2Publication Date: 2021-02-23
- Inventor: Wonhee Lee , Kyungboo Jung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2017-0157352 20171123
- Main IPC: G06T7/593
- IPC: G06T7/593 ; H04N13/00 ; G06N3/08 ; G06T7/11 ; G06K9/62

Abstract:
A disparity estimation method performed by a processor includes extracting a first image patch comprising a reference pixel from a first image, extracting a second image patch comprising a target pixel corresponding to the reference pixel from a second image, and estimating a residual of an initial disparity between the reference pixel and the target pixel from the first image patch and the second image patch using a residual model, the residual being an estimated difference between the initial disparity and an actual disparity between the reference pixel and the target pixel.
Public/Granted literature
- US20190156502A1 METHOD AND APPARATUS FOR ESTIMATING DISPARITY Public/Granted day:2019-05-23
Information query