Invention Grant
- Patent Title: Semiconductor devices
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Application No.: US16441100Application Date: 2019-06-14
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Publication No.: US10930654B2Publication Date: 2021-02-23
- Inventor: Hanjin Lim , Kijong Park , Younsoo Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Priority: KR10-2018-0155360 20181205
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/417 ; H01L49/02

Abstract:
Semiconductor devices are provided. The semiconductor devices may include an active pattern on a substrate. The active pattern may include a first source/drain region and a second source/drain region. The semiconductor devices may also include a bit line electrically connected to the first source/drain region, a first connection electrode electrically connected to the second source/drain region, and a capacitor on the first connection electrode. The capacitor may include a first electrode, a second electrode, and a dielectric pattern between the first and second electrodes. A lower portion of the dielectric pattern may overlap a top surface of the first connection electrode, and the first electrode may extend on an upper portion of a sidewall of the first connection electrode.
Public/Granted literature
- US20200185387A1 SEMICONDUCTOR DEVICES Public/Granted day:2020-06-11
Information query
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