Invention Grant
- Patent Title: IGBT having a barrier region
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Application No.: US16566141Application Date: 2019-09-10
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Publication No.: US10930772B2Publication Date: 2021-02-23
- Inventor: Alexander Philippou , Christian Jaeger , Johannes Georg Laven , Antonio Vellei
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102017107174 20170404
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/66 ; H01L29/06 ; H01L29/40 ; H01L29/10

Abstract:
An IGBT having a barrier region is presented. A power unit cell of the IGBT has at least two trenches that may both extend into the barrier region. The barrier region may be p-doped and vertically confined, i.e., in and against the extension direction, by means of the drift region. The barrier region can be electrically floating.
Public/Granted literature
- US20200006539A1 IGBT Having a Barrier Region Public/Granted day:2020-01-02
Information query
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