Invention Grant
- Patent Title: Interconnect structure with redundant electrical connectors and associated systems and methods
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Application No.: US16257438Application Date: 2019-01-25
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Publication No.: US10943888B2Publication Date: 2021-03-09
- Inventor: Anilkumar Chandolu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L25/065 ; H01L21/768 ; H01L21/56 ; H01L23/00 ; H01L25/18 ; H01L25/00 ; H01L23/498 ; H01L23/31 ; H01L23/367

Abstract:
Semiconductor die assemblies having interconnect structures with redundant electrical connectors are disclosed herein. In one embodiment, a semiconductor die assembly includes a first semiconductor die, a second semiconductor die, and an interconnect structure between the first and the second semiconductor dies. The interconnect structure includes a first conductive film coupled to the first semiconductor die and a second conductive film coupled to the second semiconductor die. The interconnect structure further includes a plurality of redundant electrical connectors extending between the first and second conductive films and electrically coupled to one another via the first conductive film.
Public/Granted literature
- US20190157246A1 INTERCONNECT STRUCTURE WITH REDUNDANT ELECTRICAL CONNECTORS AND ASSOCIATED SYSTEMS AND METHODS Public/Granted day:2019-05-23
Information query
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