Invention Grant
- Patent Title: Dielectric, capacitor and semiconductor device including the same, and method of preparing the dielectric
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Application No.: US16409096Application Date: 2019-05-10
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Publication No.: US10947126B2Publication Date: 2021-03-16
- Inventor: Doh Won Jung , Chan Kwak , Euncheol Do , Hyeon Cheol Park , Daejin Yang , Taewon Jeong , Giyoung Jo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2018-0147696 20181126
- Main IPC: H01G4/10
- IPC: H01G4/10 ; C01G35/00 ; H01L49/02

Abstract:
Provided are a dielectric, a capacitor and a semiconductor device that include the dielectric, and a method of preparing the dielectric, the dielectric including: a composition represented by Formula 1; and an oxide including a perovskite type crystal structure having a polar space group or a non-polar space group other than a Pbnm space group: AxByO3-δ wherein, in Formula 1, A is a monovalent, divalent, or trivalent cation, B is a trivalent, tetravalent, or pentavalent cation, and 0.5≤x≤1.5, 0.5≤y≤1.5, and 0≤δ≤0.5.
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