Invention Grant
- Patent Title: Temporal atomic layer deposition process chamber
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Application No.: US16467817Application Date: 2017-12-05
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Publication No.: US10954596B2Publication Date: 2021-03-23
- Inventor: Alexander S. Polyak , Joseph Yudovsky
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- International Application: PCT/US2017/064598 WO 20171205
- International Announcement: WO2018/106627 WO 20180614
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455

Abstract:
A dual channel showerhead comprising a first plurality of channels formed in the back surface of the showerhead and extending from a first end to a second end, a second plurality of channels formed through the thickness of the showerhead and extending from a first end to a second end, a first end plenum in fluid connection with the second plurality of channels at the first end and a second end plenum in fluid connection with the second plurality of channels at the second end. Processing chambers including the dual channel showerhead and a blocker ring separating the edge ring from the pumping ring are also discussed.
Public/Granted literature
- US20200032396A1 Temporal Atomic Layer Deposition Process Chamber Public/Granted day:2020-01-30
Information query
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