- 专利标题： Substrate treatment device and method and encoder scale treated by this method
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申请号： US12659404申请日： 2010-03-08
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公开(公告)号： US10982334B2公开(公告)日： 2021-04-20
- 发明人: Alexander David Scott Ellin , James Reynolds Henshaw , David Roberts McMurtry
- 申请人： Alexander David Scott Ellin , James Reynolds Henshaw , David Roberts McMurtry
- 申请人地址： GB Gloucestershire; GB Gloucestershire; GB Gloucestershire
- 专利权人： Alexander David Scott Ellin,James Reynolds Henshaw,David Roberts McMurtry
- 当前专利权人： Alexander David Scott Ellin,James Reynolds Henshaw,David Roberts McMurtry
- 当前专利权人地址： GB Gloucestershire; GB Gloucestershire; GB Gloucestershire
- 代理机构： Oliff PLC
- 优先权： GB0127410.9 20011115
- 主分类号： B23K26/00
- IPC分类号： B23K26/00 ; C03C15/00 ; C23F1/02 ; B23K26/04 ; B23K26/08 ; G01D5/347 ; B23K26/361
摘要：
The invention provides a substrate treatment method and apparatus. Embodiments show a substrate in the form of a rotary encoder ring having a pattern of marks producable by means of a laser treatment device controllable to produce the pattern in the correct manner while there is continuous relative displacement between the ring and the laser treatment device.
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