Invention Grant
- Patent Title: Valve apparatus
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Application No.: US16544513Application Date: 2019-08-19
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Publication No.: US10982782B2Publication Date: 2021-04-20
- Inventor: Dae Wee Kong , Se Jin Kyung , Chul Hwan Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2018-0137185 20181109
- Main IPC: F16K11/10
- IPC: F16K11/10 ; F15D1/02

Abstract:
A valve apparatus includes a valve block with a main flow path, a first valve installed on the valve block and connected to the main flow path so that when the first valve turns on, a first fluid is supplied from the main flow path to a process chamber via the first valve, and a second valve installed on the valve block and connected to the main flow path so that when the first valve turns off and the second valve turns on, a second fluid is supplied from the main flow path to a waste gas treatment system via the second valve. The main flow path is disposed parallel to a central axis passing through a center of the valve block and two opposing surfaces of the valve block perpendicularly thereto. The main flow path is disposed to be offset from the central axis toward the first valve.
Public/Granted literature
- US20200149642A1 VALVE APPARATUS Public/Granted day:2020-05-14
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