Invention Grant
- Patent Title: Pellicle and pellicle assembly
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Application No.: US16667956Application Date: 2019-10-30
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Publication No.: US10983431B2Publication Date: 2021-04-20
- Inventor: David Ferdinand Vles , Erik Achilles Abegg , Aage Bendiksen , Derk Servatius Gertruda Brouns , Pradeep K. Govil , Paul Janssen , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , James Norman Wiley
- Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- Applicant Address: NL Veldhoven; NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP15200767 20151217
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F1/64 ; G03F1/22 ; G03F7/20 ; G03F1/62
Abstract:
A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
Public/Granted literature
- US20200064731A1 PELLICLE AND PELLICLE ASSEMBLY Public/Granted day:2020-02-27
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