Invention Grant
- Patent Title: Selection of substrate measurement recipes
-
Application No.: US16301458Application Date: 2017-05-09
-
Publication No.: US10983440B2Publication Date: 2021-04-20
- Inventor: Jen-Shiang Wang , Jay Jianhui Chen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/061049 WO 20170509
- International Announcement: WO2017/202602 WO 20171130
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method including: obtaining a relationship between a performance indicator of a substrate measurement recipe and a parameter of the substrate measurement recipe; deriving a range of the parameter from the relationship, wherein absolute values of the performance indicator satisfy a first condition or a magnitude of variation of the performance indicator satisfies a second condition, when the first parameter is in the range; selecting a substrate measurement recipe that has the parameter in the range; and inspecting a substrate with the selected substrate measurement recipe.
Public/Granted literature
- US20190258172A1 SELECTION OF SUBSTRATE MEASUREMENT RECIPES Public/Granted day:2019-08-22
Information query
IPC分类: