Invention Grant
- Patent Title: Lithography apparatus and cleaning method thereof
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Application No.: US16181111Application Date: 2018-11-05
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Publication No.: US10990026B2Publication Date: 2021-04-27
- Inventor: Chi Yang , Sheng-Ta Lin , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method for cleaning a lithography apparatus is provided. The method includes flowing a major cleaning agent in volume over a reflective surface of a collector of the lithography apparatus; and flowing a minor cleaning agent in volume intermittently over the reflective surface of the collector, so as to clean the reflective surface of the collector.
Public/Granted literature
- US20200057393A1 LITHOGRAPHY APPARATUS AND CLEANING METHOD THEREOF Public/Granted day:2020-02-20
Information query
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