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公开(公告)号：US11693324B2
公开(公告)日：2023-07-04
申请号：US17484945
申请日：2021-09-24
发明人： Shih-Yu Tu , Chieh Hsieh , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC分类号： G03F7/7085 , G03F7/70033 , G03F7/70916 , G03F7/70925 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet (EUV) photolithography system detects debris travelling from an EUV generation chamber to a scanner. The photolithography system includes a detection light source and a sensor. The detection light source outputs a detection light across a path of travel of debris particles from the EUV generation chamber. The sensor senses debris particles by detecting interaction of the debris particles with the detection light.
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公开(公告)号：US11662668B2
公开(公告)日：2023-05-30
申请号：US17461744
申请日：2021-08-30
发明人： Chieh Hsieh , Tai-Yu Chen , Cho-Ying Lin , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
CPC分类号： G03F7/70925 , G02B17/0663 , G03F7/70033 , G03F7/70491 , G03F7/70808 , H05G2/008
摘要： A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
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公开(公告)号：US11528797B2
公开(公告)日：2022-12-13
申请号：US17233220
申请日：2021-04-16
发明人： Yu-Kuang Sun , Cheng-Hao Lai , Yu-Huan Chen , Wei-Shin Cheng , Ming-Hsun Tsai , Hsin-Feng Chen , Chiao-Hua Cheng , Cheng-Hsuan Wu , Yu-Fa Lo , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
摘要： An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
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公开(公告)号：US11297710B2
公开(公告)日：2022-04-05
申请号：US16787947
申请日：2020-02-11
发明人： Ssu-Yu Chen , Shang-Chieh Chien , Li-Jui Chen
摘要： An extreme ultraviolet (EUV) light source and a method for patterning a resist layer on a substrate using the EUV light source are disclosed. For example, the EUV light source includes a volume to collect liquid tin debris remaining after a plasma generation process, a cover coupled to the volume, wherein the cover comprises at least one opening to allow the liquid tin debris to fall through the at least one opening of the cover and into the volume, and a heater coupled to the cover, wherein the heater is to melt solid tin that forms from cooling of the liquid tin debris on a surface around the at least one opening of the cover.
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公开(公告)号：US11243479B2
公开(公告)日：2022-02-08
申请号：US16683432
申请日：2019-11-14
发明人： Hsiang Chen , Sheng-Kang Yu , Shang-Chieh Chien , Li-Jui Chen
摘要： A method of controlling a temperature of the semiconductor device includes operating an semiconductor apparatus; maintaining a temperature of a vessel of the semiconductor apparatus with a first cooling output by a cooling controller; heating the vessel for removing a material on the vessel; transferring a first signal, by a converter, to the cooling controller when heating the vessel; and reducing the first cooling output to a second cooling output by the cooling controller base on the first signal.
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公开(公告)号：US11150564B1
公开(公告)日：2021-10-19
申请号：US17037558
申请日：2020-09-29
发明人： Tao-Hsin Chen , Li-Jui Chen , Chia-Yu Lee
IPC分类号： G03F7/20
摘要： An EUV lithographic apparatus includes a wafer stage and a particle removing assembly for cleaning a wafer for an extreme ultraviolet (EUV) lithographic apparatus. The wafer stage includes a measurement side and an exposure side. The particle removing assembly includes particle removing electrodes, an exhaust device and turbomolecular pumps. The particle removing electrodes is configured to direct debris from the chamber by suppressing turbulence such that the debris can be exhausted from the wafer stage to the outside of the processing apparatus. In some embodiments, turbomolecular pumps are turned off in the measurement side of the wafer stage so that an exhaust flow can be guided to an exposure side of the wafer stage. In some embodiments, the speed of voltage rise to the electrodes of the wafer chuck is adjusted.
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公开(公告)号：US11150561B2
公开(公告)日：2021-10-19
申请号：US16927131
申请日：2020-07-13
发明人： Hung-Wen Cho , Fu-Jye Liang , Chun-Kuang Chen , Chih-Tsung Shih , Li-Jui Chen , Po-Chung Cheng , Chin-Hsiang Lin
摘要： A method for collecting information in image-error compensation is provided. The method includes providing a reticle having a first image structure and a second image structure; moving a light shading member to control a first exposure field; projecting a light over the first exposure field; recording an image of the first image structure after the light is projected; moving the light shading member to control a second exposure field; projecting the light over the second exposure field; and recording an image of the second image structure after the light is projected.
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公开(公告)号：US11121018B2
公开(公告)日：2021-09-14
申请号：US16926935
申请日：2020-07-13
发明人： Chueh-Chi Kuo , Tsung-Yen Lee , Chia-Hsin Chou , Tzung-Chi Fu , Li-Jui Chen , Po-Chung Cheng , Che-Chang Hsu
IPC分类号： G03F1/24 , H01L21/683 , G03F7/20
摘要： A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
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公开(公告)号：US11086225B2
公开(公告)日：2021-08-10
申请号：US16887245
申请日：2020-05-29
发明人： Wei-Shin Cheng , Hsin-Feng Chen , Cheng-Hao Lai , Shao-Hua Wang , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng
摘要： A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
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公开(公告)号：US20210235572A1
公开(公告)日：2021-07-29
申请号：US17228157
申请日：2021-04-12
发明人： Chun-Lin Louis Chang , Jen-Hao Yeh , Han-Lung Chang , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
摘要： A system includes a laser source operable to provide a laser beam, a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier, and a residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path.
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