Invention Grant
- Patent Title: Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
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Application No.: US16856128Application Date: 2020-04-23
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Publication No.: US10996571B2Publication Date: 2021-05-04
- Inventor: Robert John Socha , Arie Jeffrey Den Boef , Nitesh Pandey
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/956 ; G01B11/27 ; G01N21/88
Abstract:
A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.
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