Invention Grant
- Patent Title: Charged-particle beam apparatus, charged-particle beam writing apparatus, and charged-particle beam controlling method
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Application No.: US16126105Application Date: 2018-09-10
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Publication No.: US10998162B2Publication Date: 2021-05-04
- Inventor: Nobuo Miyamoto , Munehiro Ogasawara
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Yokohama
- Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2017-174119 20170911
- Main IPC: H01J37/07
- IPC: H01J37/07 ; H01J37/09 ; H01J37/063 ; H01J37/317

Abstract:
A charged-particle beam apparatus is provided with a cathode to emit charged particle beams, an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction, an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction, and a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.
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Information query
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