- 专利标题： Substrates and methods of using those substrates
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申请号： US16610103申请日： 2018-05-01
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公开(公告)号： US11016401B2公开(公告)日： 2021-05-25
- 发明人: Matthew Lipson , Christopher John Mason , Damoon Sohrabibabaheidary , Jimmy Matheus Wilhelmus Van De Winkel , Bert Dirk Scholten
- 申请人： ASML HOLDING N.V. , ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven; NL Veldhoven
- 专利权人： ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- 当前专利权人： ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven; NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2018/061063 WO 20180501
- 国际公布： WO2018/215172 WO 20181129
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
公开/授权文献
- US20200073262A1 SUBSTRATES AND METHODS OF USING THOSE SUBSTRATES 公开/授权日：2020-03-05
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