公开(公告)号：US11016401B2

公开(公告)日：2021-05-25

申请号：US16610103

申请日：2018-05-01

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Matthew Lipson ,  Christopher John Mason ,  Damoon Sohrabibabaheidary ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Bert Dirk Scholten

IPC: G03F7/20

Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

公开(公告)号：US12111581B2

公开(公告)日：2024-10-08

申请号：US17291086

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： Mehmet Ali Akbas ,  Tammo Uitterdijk ,  Christopher John Mason ,  Matthew Lipson ,  David Hart Peterson ,  Michael Perry ,  Peter Helmus ,  Jerry Jianguo Deng ,  Damoon Sohrabibabaheidary

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/687

CPC classification number: G03F7/707 ,  G03F7/70491 ,  H01L21/6875

Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.