Invention Grant
- Patent Title: Sensor, lithographic apparatus, and device manufacturing method
-
Application No.: US16623647Application Date: 2018-05-14
-
Publication No.: US11022902B2Publication Date: 2021-06-01
- Inventor: Arie Jeffrey Den Boef , Patricius Aloysius Jacobus Tinnemans , Haico Victor Kok , William Peter Van Drent , Sebastianus Adrianus Goorden
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP17176549 20170619
- International Application: PCT/EP2018/062387 WO 20180514
- International Announcement: WO2018/233929 WO 20181227
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03F7/20

Abstract:
The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
Public/Granted literature
- US20210072647A1 Sensor, Lithographic Apparatus, and Device Manufacturing Method Public/Granted day:2021-03-11
Information query