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公开(公告)号：US11022902B2
公开(公告)日：2021-06-01
申请号：US16623647
申请日：2018-05-14
发明人： Arie Jeffrey Den Boef , Patricius Aloysius Jacobus Tinnemans , Haico Victor Kok , William Peter Van Drent , Sebastianus Adrianus Goorden
摘要： The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
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公开(公告)号：US11846887B2
公开(公告)日：2023-12-19
申请号：US17715641
申请日：2022-04-07
发明人： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC分类号： G03F7/00
CPC分类号： G03F7/70166 , G03F7/70033 , G03F7/70883 , G03F7/70916 , G03F7/70925
摘要： Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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公开(公告)号：US20240160109A1
公开(公告)日：2024-05-16
申请号：US18508987
申请日：2023-11-14
发明人： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC分类号： G03F7/00
CPC分类号： G03F7/70166 , G03F7/70033 , G03F7/70883 , G03F7/70916 , G03F7/70925
摘要： Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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公开(公告)号：US11982947B2
公开(公告)日：2024-05-14
申请号：US18070155
申请日：2022-11-28
发明人： Sander Catharina Reinier Derks , Daniel Jozef Maria Direcks , Maurice Wilhelmus Leonardus Hendricus Feijts , Pieter Gerardus Mathijs Hoeijmakers , Katja Cornelia Joanna Clasina Moors , Violeta Navarro Paredes , William Peter Van Drent , Jan Steven Christiaan Westerlaken
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70891 , H05G2/005 , H05G2/008
摘要： A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.
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公开(公告)号：US20220291591A1
公开(公告)日：2022-09-15
申请号：US17715641
申请日：2022-04-07
发明人： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC分类号： G03F7/20
摘要： Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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公开(公告)号：US11340532B2
公开(公告)日：2022-05-24
申请号：US16977360
申请日：2019-02-28
发明人： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC分类号： G03F7/20
摘要： Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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公开(公告)号：US11556067B2
公开(公告)日：2023-01-17
申请号：US17603687
申请日：2020-03-10
发明人： Sander Catharina Reinier Derks , Daniel Jozef Maria Direcks , Maurice Wilhelmus Leonardus Hendricus Feijts , Pieter Gerardus Mathijs Hoeijmakers , Katja Cornelia Joanna Clasina Moors , Violeta Navarro Paredes , William Peter Van Drent , Jan Steven Christiaan Westerlaken
摘要： A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1K−1.
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公开(公告)号：US20210109452A1
公开(公告)日：2021-04-15
申请号：US16977360
申请日：2019-02-28
发明人： Yue Ma , Antonius Theodorus Wilhelmus Kempen , Klaus Martin Hummler , Johannes Hubertus Josephina Moors , Jeroen Hubert Rommers , Hubertus Johannes Van De Wiel , Andrew David Laforge , Fernando Brizuela , Rob Carlo Wieggers , Umesh Prasad Gomes , Elena Nedanovska , Celal Korkmaz , Alexander Downn Kim , Rui Miguel Duarte Rodrigues Nunes , Hendrikus Alphonsus Ludovicus Van Dijck , William Peter Van Drent , Peter Gerardus Jonkers , Qiushi Zhu , Parham Yaghoobi , Jan Steven Christiaan Westerlaken , Martinus Hendrikus Antonius Leenders , Alexander Igorevich Ershov , Igor Vladimirovich Fomenkov , Fei Liu , Johannes Henricus Wilhelmus Jacobs , Alexey Sergeevich Kuznetsov
IPC分类号： G03F7/20
摘要： Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
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公开(公告)号：US09696638B2
公开(公告)日：2017-07-04
申请号：US14965467
申请日：2015-12-10
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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公开(公告)号：US09229340B2
公开(公告)日：2016-01-05
申请号：US14036991
申请日：2013-09-25
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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