- 专利标题: Sensor, lithographic apparatus, and device manufacturing method
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申请号: US16623647申请日: 2018-05-14
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公开(公告)号: US11022902B2公开(公告)日: 2021-06-01
- 发明人: Arie Jeffrey Den Boef , Patricius Aloysius Jacobus Tinnemans , Haico Victor Kok , William Peter Van Drent , Sebastianus Adrianus Goorden
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权: EP17176549 20170619
- 国际申请: PCT/EP2018/062387 WO 20180514
- 国际公布: WO2018/233929 WO 20181227
- 主分类号: G03B27/72
- IPC分类号: G03B27/72 ; G03F7/20
摘要:
The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
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