- Patent Title: Method for producing a probe suitable for scanning probe microscopy
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Application No.: US16802944Application Date: 2020-02-27
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Publication No.: US11035880B2Publication Date: 2021-06-15
- Inventor: Thomas Hantschel , Thijs Boehme
- Applicant: IMEC VZW , Katholieke Universiteit Leuven, KU LEUVEN R&D
- Applicant Address: BE Leuven; BE Leuven
- Assignee: IMEC VZW,Katholieke Universiteit Leuven, KU LEUVEN R&D
- Current Assignee: IMEC VZW,Katholieke Universiteit Leuven, KU LEUVEN R&D
- Current Assignee Address: BE Leuven; BE Leuven
- Agency: McDonnell Boehnen Hulbert & Berghoff LLP
- Priority: EP19160202 20190301
- Main IPC: G01Q70/14
- IPC: G01Q70/14 ; G01Q70/06 ; G01Q10/04 ; G01Q60/02

Abstract:
Example embodiments relate to methods for producing a probe suitable for scanning probe microscopy. One embodiment includes a method for producing a probe tip suitable for scanning probe microscopy. The method includes producing a probe tip body that includes at least an outer layer of a probe material. The method also includes, during the production of the probe tip body or after the production, forming a mask layer on the outer layer of probe material. Further, the method includes subjecting the probe tip body to a plasma etch procedure. The mask layer acts as an etch mask for the plasma etch procedure. The plasma etch procedure and the etch mask are configured to produce one or more tip portions formed of the probe material. The one or more tip portions are smaller and more pointed than the probe tip body prior to the plasma etch procedure.
Public/Granted literature
- US20200278379A1 Method for Producing a Probe Suitable for Scanning Probe Microscopy Public/Granted day:2020-09-03
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