- 专利标题: Low temperature method of forming layered HT-LiCoO2
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申请号: US15631723申请日: 2017-06-23
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公开(公告)号: US11047049B2公开(公告)日: 2021-06-29
- 发明人: Kevin W. Brew , Saurabh Singh , Teodor K. Todorov
- 申请人: International Business Machines Corporation
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Michael J. Chang, LLC
- 代理商 Randall Bluestone
- 主分类号: C23C18/00
- IPC分类号: C23C18/00 ; C23C18/12 ; H01M4/04 ; H01M4/525 ; B01J23/78 ; H01M10/0562 ; H01M10/0525 ; H01M4/131 ; H01M4/1391
摘要:
Low temperature techniques for forming layered lithium cobalt oxide (LCO) are provided. In one aspect, a method of synthesizing layered LCO includes: forming a metal catalyst layer (e.g., platinum) on a substrate; depositing LCO onto the metal catalyst layer; and annealing the LCO under conditions sufficient to form the layered LCO on the metal catalyst layer. An adhesion layer can be deposited on the substrate, and the metal catalyst layer can be deposited onto the adhesion layer. In another aspect, a structure is provided including: a substrate; a metal catalyst layer (e.g., platinum) disposed on the substrate; and layered LCO formed on the metal catalyst layer. An adhesion layer can be disposed between the substrate and the metal catalyst layer.
公开/授权文献
- US20180371617A1 Low Temperature Method of Forming Layered HT-LiCoO2 公开/授权日:2018-12-27
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