- 专利标题: Stage apparatus and charged particle beam apparatus
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申请号: US16683340申请日: 2019-11-14
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公开(公告)号: US11049687B2公开(公告)日: 2021-06-29
- 发明人: Motohiro Takahashi , Masaki Mizuochi , Shuichi Nakagawa , Tomotaka Shibazaki , Naruo Watanabe , Hironori Ogawa , Takanori Kato , Akira Nishioka
- 申请人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly & Malur, PC
- 优先权: JPJP2018-227590 20181204
- 主分类号: H01J37/20
- IPC分类号: H01J37/20 ; G01C9/06
摘要:
A stage includes a sample table on which a sample is placed, a first drive mechanism moving the sample table in a first direction; a position measurement element measuring a position in the first direction that is a driving direction of the sample table. The stage also has a scale element having a scale measurement axis that is parallel to a first measurement axis in the first direction based on the position measurement element and is different from the first measurement axis in height, and measuring the position of the sample table in the first direction. A controller calculates the orientation of the sample table by using a measurement value by the position measurement element and a measurement value by the scale element and correcting the Abbe error of the sample table.
公开/授权文献
- US20200176217A1 STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS 公开/授权日:2020-06-04
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