Invention Grant
- Patent Title: Tool and method for cleaning electrostatic chuck
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Application No.: US16358561Application Date: 2019-03-19
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Publication No.: US11056371B2Publication Date: 2021-07-06
- Inventor: Yueh-Lin Yang , Chi-Hung Liao
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H01L21/683
- IPC: H01L21/683 ; B08B7/00 ; H01L21/67 ; C23C14/50 ; B08B3/04
Abstract:
A method includes transmitting a radiation toward an electrostatic chuck, receiving a reflection of the radiation, analyzing the reflection of the radiation, determining whether a particle is present on the electrostatic chuck based on the analyzing the reflection of the radiation, and moving a cleaning tool to a location of the particle on the electrostatic chuck when the determination determines that the particle is present.
Public/Granted literature
- US20200058536A1 TOOL AND METHOD FOR CLEANING ELECTROSTATIC CHUCK Public/Granted day:2020-02-20
Information query
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