发明授权
- 专利标题: Vapor chamber
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申请号: US16521487申请日: 2019-07-24
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公开(公告)号: US11079183B2公开(公告)日: 2021-08-03
- 发明人: Hirofumi Aoki , Yoshikatsu Inagaki , Hiroshi Sakai
- 申请人: FURUKAWA ELECTRIC CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: FURUKAWA ELECTRIC CO., LTD.
- 当前专利权人: FURUKAWA ELECTRIC CO., LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Dorsey & Whitney LLP
- 优先权: JPJP2017-013588 20170127,JPJP2017-018857 20170203
- 主分类号: F28D15/00
- IPC分类号: F28D15/00 ; F28D15/04
摘要:
A vapor chamber excellent in productivity, reduction of a number of components, and capable of preventing reduction in area of a cavity section while reducing a space of an outer periphery of the cavity section in which a working fluid is sealed is provided. An example vapor chamber has a container in which a cavity section is formed by stacked plate-shaped members, a working fluid that is sealed in the cavity section, and a wick structure accommodated in the cavity section.
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