Invention Grant
- Patent Title: Device to increase deposition uniformity in spatial ALD processing chamber
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Application No.: US16685447Application Date: 2019-11-15
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Publication No.: US11085129B2Publication Date: 2021-08-10
- Inventor: Joseph Yudovsky , Alexander S. Polyak
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C30B25/10 ; H01L21/67 ; H01L21/687 ; C23C16/455 ; C23C16/458 ; C23C16/46 ; C30B25/12
Abstract:
Susceptor assemblies comprising a susceptor with a top surface with a plurality of recesses and a bottom surface are described. A heater is positioned below the susceptor to heat the susceptor. A shield is positioned between the bottom surface of the susceptor and the heater. The shield increases deposition uniformity across the susceptor.
Public/Granted literature
- US20200087816A1 Device To Increase Deposition Uniformity In Spatial ALD Processing Chamber Public/Granted day:2020-03-19
Information query
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