Invention Grant
- Patent Title: Non-volatile memory device
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Application No.: US16944312Application Date: 2020-07-31
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Publication No.: US11087844B2Publication Date: 2021-08-10
- Inventor: Chanho Kim , Kyunghwa Yun , Daeseok Byeon
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Priority: KR10-2019-0108469 20190902
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/10 ; G11C16/26 ; G11C16/08

Abstract:
A non-volatile memory device includes a memory cell region including a first metal pad and a memory cell array including a plurality of memory cells, and a peripheral circuit region including a second metal pad and vertically connected to the memory cell region. The memory cell region includes a plurality of word lines, a ground selection line in a layer on the word lines, a common source line in a layer on the ground selection line, a plurality of vertical pass transistors in the stair area, and a plurality of driving signal lines in the same layer as the common source line. The word lines form a stair shape in the stair area, and each of the vertical pass transistors is connected between a corresponding one of the word lines and a corresponding one of the driving signal lines.
Public/Granted literature
- US20210065799A1 NON-VOLATILE MEMORY DEVICE Public/Granted day:2021-03-04
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