Invention Grant
- Patent Title: Preparation of compound semiconductor substrate for epitaxial growth via non-destructive epitaxial lift-off
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Application No.: US16595552Application Date: 2019-10-08
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Publication No.: US11087974B2Publication Date: 2021-08-10
- Inventor: Stephen R. Forrest , Kyusang Lee
- Applicant: The Regents of The University of Michigan
- Applicant Address: US MI Ann Arbor
- Assignee: The Regents of The University of Michigan
- Current Assignee: The Regents of The University of Michigan
- Current Assignee Address: US MI Ann Arbor
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/324 ; H01L21/78 ; H01L21/67

Abstract:
A method is presented for fabricating a substrate comprised of a compound semiconductor. The method includes: growing a sacrificial layer onto a parent substrate; growing an epitaxial template layer on the sacrificial layer; removing the template layer from the parent substrate using an epitaxial lift-off procedure; and bonding the removed template layer to a host substrate using Van der Waals forces and thereby forming a compound semiconductor substrate.
Information query
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