- 专利标题: Contact between interconnect and cell in solid oxide cell stacks
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申请号: US16466946申请日: 2017-12-01
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公开(公告)号: US11088372B2公开(公告)日: 2021-08-10
- 发明人: Tobias Holt Nørby , Bengt Peter Gustav Blennow , Rainer Küngas , Jeppe Rass-Hansen , Thomas Heiredal-Clausen
- 申请人: Haldor Topsøe A/S
- 申请人地址: DK Kgs. Lyngby
- 专利权人: Haldor Topsøe A/S
- 当前专利权人: Haldor Topsøe A/S
- 当前专利权人地址: DK Kgs. Lyngby
- 代理机构: Blank Rome LLP
- 优先权: DKPA201600772 20161216
- 国际申请: PCT/EP2017/081233 WO 20171201
- 国际公布: WO2018/108581 WO 20180621
- 主分类号: H01M4/64
- IPC分类号: H01M4/64 ; H01M8/0228 ; H01M8/021 ; H01M8/0215 ; H01M8/124
摘要:
Improved contact between interconnect and oxygen electrode material in solid oxide cell (SOC) stacks is achieved through a contact point between the oxygen electrode or an oxygen-side contact layer of the SOC and a coated ferritic stainless steel interconnect in the SOC stack, where the coating on the metallic interconnect comprises Cu.
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