- 专利标题: Swirling flow generation device and deposition device
-
申请号: US16727104申请日: 2019-12-26
-
公开(公告)号: US11090591B2公开(公告)日: 2021-08-17
- 发明人: Kazuma Miyazawa , Kunihiro Sasaoka
- 申请人: SEIKO EPSON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: SEIKO EPSON CORPORATION
- 当前专利权人: SEIKO EPSON CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Global IP Counselors, LLP
- 优先权: JPJP2018-248036 20181228
- 主分类号: B01D45/00
- IPC分类号: B01D45/00 ; B01D45/14 ; B04C3/06 ; B04C3/00 ; D21F9/00 ; D21B1/34 ; D21B1/32 ; D21D5/06
摘要:
A swirling flow generation device includes a first pipe having a first pipe axis and through which gas passes, a second pipe having a second pipe axis in a direction different from the first pipe axis and communicates with downstream of the first pipe, and an airflow changing unit provided in the first pipe and having an opening eccentric from the first pipe axis. A swirling flow is formed in the second pipe as the center of the airflow passed through the opening flows into the second pipe at a position that is eccentric from the second pipe axis.
公开/授权文献
- US20200206668A1 SWIRLING FLOW GENERATION DEVICE AND DEPOSITION DEVICE 公开/授权日:2020-07-02
信息查询