- 专利标题： Optical emission spectroscopy system, method of calibrating the same, and method of fabricating semiconductor device
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申请号： US16293026申请日： 2019-03-05
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公开(公告)号： US11092495B2公开(公告)日： 2021-08-17
- 发明人: Jeongil Mun , Hyung Joo Lee , Jongwoo Sun
- 申请人： SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址： KR Suwon-si
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址： KR Suwon-si
- 代理机构： Lee IP Law, P.C.
- 优先权： KR10-2018-0091994 20180807
- 主分类号： G01J3/443
- IPC分类号： G01J3/443 ; G01J3/02 ; G01J3/04 ; G01N21/27 ; G01N21/67 ; G01N21/68 ; H01J37/32
摘要：
An optical emission spectroscopy system may include a reference light source, an analyzer to receive and analyze light transmitted from the reference light source, and a calibrator to calibrate light emitted from the reference light source. The calibrator may change a calibration ratio in accordance with an incidence angle of the light.
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