Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16848010Application Date: 2020-04-14
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Publication No.: US11121175B2Publication Date: 2021-09-14
- Inventor: Kilho Lee , Gwanhyeob Koh
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0122468 20191002
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L27/22 ; G11C11/02 ; G11C11/56

Abstract:
A semiconductor device including a substrate that has a first region and a second region, a plurality of lower conductive patterns on the substrate, the plurality of lower conductive patterns including a first conductive pattern in the first region of the substrate and a second conductive pattern in the second region of the substrate, a magnetic tunnel junction on the first conductive pattern, a contact between the magnetic tunnel junction and the first conductive pattern, a through electrode on the second conductive pattern, and a plurality of upper conductive patterns on the magnetic tunnel junction and the through electrode. The contact includes a first contact on the lower conductive patterns, a second contact on the first contact, and a first barrier layer that covers a bottom surface and a lateral surface of the second contact.
Public/Granted literature
- US20210104575A1 SEMICONDUCTOR DEVICE Public/Granted day:2021-04-08
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