• 专利标题: Manufacturing method for glass substrate, method for forming hole in glass substrate, and apparatus for forming hole in glass substrate
  • 申请号: US15472636
    申请日: 2017-03-29
  • 公开(公告)号: US11123822B2
    公开(公告)日: 2021-09-21
  • 发明人: Motoshi Ono
  • 申请人: AGC Inc.
  • 申请人地址: JP Chiyoda-ku
  • 专利权人: AGC Inc.
  • 当前专利权人: AGC Inc.
  • 当前专利权人地址: JP Chiyoda-ku
  • 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
  • 优先权: JPJP2016-072638 20160331,JPJP2017-061906 20170327
  • 主分类号: B23K26/382
  • IPC分类号: B23K26/382 B23K26/402 B23K103/00
Manufacturing method for glass substrate, method for forming hole in glass substrate, and apparatus for forming hole in glass substrate
摘要:
A manufacturing method for a glass substrate having a hole with a depth of d (μm) or more includes irradiating the glass substrate with a laser beam emitted from a CO2 laser oscillator for an irradiation time t (μsec), to form a hole in the glass substrate. The laser beam is delivered to the glass substrate after being condensed at a focusing lens. A power density Pd (W/cm2), defined by Pd=P0/S where P0 and S are a power and a beam cross-sectional area of the laser beam just prior to entering the focusing lens, respectively, is 600 W/cm2 or less. The irradiation time t (μsec) satisfies t≥10×d/(Pd)1/2.
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