Invention Grant
- Patent Title: Nanostructure barrier for copper wire bonding
-
Application No.: US16854839Application Date: 2020-04-21
-
Publication No.: US11127515B2Publication Date: 2021-09-21
- Inventor: Nazila Dadvand , Christopher Daniel Manack , Salvatore Frank Pavone
- Applicant: Texas Instruments Incorporated
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Dawn Jos; Charles A. Brill; Frank D. Cimino
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01B13/00 ; H01B1/02

Abstract:
A nanostructure barrier for copper wire bonding includes metal grains and inter-grain metal between the metal grains. The nanostructure barrier includes a first metal selected from nickel or cobalt, and a second metal selected from tungsten or molybdenum. A concentration of the second metal is higher in the inter-grain metal than in the metal grains. The nanostructure barrier may be on a copper core wire to provide a coated bond wire. The nanostructure barrier may be on a bond pad to form a coated bond pad. A method of plating the nanostructure barrier using reverse pulse plating is disclosed. A wire bonding method using the coated bond wire is disclosed.
Public/Granted literature
- US20200251257A1 NANOSTRUCTURE BARRIER FOR COPPER WIRE BONDING Public/Granted day:2020-08-06
Information query
IPC分类: