Invention Grant
- Patent Title: Display device and method for manufacturing same
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Application No.: US16852925Application Date: 2020-04-20
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Publication No.: US11133337B2Publication Date: 2021-09-28
- Inventor: Hajime Watakabe , Isao Suzumura , Akihiro Hanada , Yohei Yamaguchi
- Applicant: Japan Display Inc.
- Applicant Address: JP Tokyo
- Assignee: Japan Display Inc.
- Current Assignee: Japan Display Inc.
- Current Assignee Address: JP Tokyo
- Agency: Michael Best & Friedrich LLP
- Priority: JPJP2017-207026 20171026
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L29/00 ; H01L27/12 ; H01L29/24 ; H01L29/66 ; H01L29/786

Abstract:
A display device including a substrate having thin film transistors (TFT) comprising: the TFT including an oxide semiconductor film, a gate electrode and an insulating film formed between the oxide semiconductor film and the gate electrode, wherein a first aluminum oxide film and a second aluminum oxide film, which is formed on the first aluminum oxide film, are formed between the insulating film and the gate electrode, an oxygen concentration in the first aluminum oxide film is bigger than an oxygen concentration in the second aluminum oxide film.
Public/Granted literature
- US20200251505A1 DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2020-08-06
Information query
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