Invention Grant
- Patent Title: Droplet generator assembly and method for using the same and radiation source apparatus
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Application No.: US16508596Application Date: 2019-07-11
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Publication No.: US11134558B2Publication Date: 2021-09-28
- Inventor: Shih-Yu Tu , Yu-Kuang Sun , Shao-Hua Wang , Han-Lung Chang , Hsiao-Lun Chang , Li-Jui Chen , Po-Chung Cheng , Cheng-Hao Lai , Hsin-Feng Chen , Wei-Shin Cheng , Ming-Hsun Tsai , Yen-Hsun Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.
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