A wiring structure and a method for manufacturing a wiring structure are provided. The wiring structure includes a first conductive structure, a second conductive structure, a dent structure and an adhesion layer. The first conductive structure includes at least one dielectric layer and at least one circuit layer in contact with the dielectric layer. The second conductive structure includes at least one dielectric layer and at least one circuit layer in contact with the dielectric layer. The dent structure is attached to the first conductive structure. The adhesion layer is interposed between the first conductive structure and the second conductive structure to bond the first conductive structure and the second conductive structure together. A periphery portion of the adhesion layer is disposed in a gap between the dent structure and the second conductive structure.