Invention Grant
- Patent Title: Film formation apparatus and film formation method
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Application No.: US16705432Application Date: 2019-12-06
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Publication No.: US11142842B2Publication Date: 2021-10-12
- Inventor: Tatsuji Nagaoka , Fumiaki Kawai , Hiroyuki Nishinaka , Masahiro Yoshimoto
- Applicant: DENSO CORPORATION , NATIONAL UNIVERSITY CORPORATION KYOTO INSTITUTE OF TECHNOLOGY
- Applicant Address: JP Aichi-pref; JP Toyota
- Assignee: DENSO CORPORATION,NATIONAL UNIVERSITY CORPORATION KYOTO INSTITUTE OF TECHNOLOGY
- Current Assignee: DENSO CORPORATION,NATIONAL UNIVERSITY CORPORATION KYOTO INSTITUTE OF TECHNOLOGY
- Current Assignee Address: JP Aichi-pref; JP Toyota
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2018-231958 20181211
- Main IPC: C30B23/00
- IPC: C30B23/00 ; C30B7/00 ; C30B29/16 ; C30B19/08 ; C30B7/14
Abstract:
A film formation apparatus is configured to supply mist of a solution to a surface of a substrate so as to grow a film on the surface of the substrate, and the film formation apparatus may include: a furnace configured to house the substrate so as to heat the substrate; and a mist supply apparatus configured to supply the mist of the solution to the furnace, in which the film formation apparatus includes a portion configured to be exposed to the mist, and at least a part of the portion of the film formation apparatus is constituted of a material comprising boron nitride.
Public/Granted literature
- US20200181795A1 FILM FORMATION APPARATUS AND FILM FORMATION METHOD Public/Granted day:2020-06-11
Information query
