发明授权
- 专利标题： Fluid handling structure, lithographic apparatus and device manufacturing method
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申请号： US15196120申请日： 2016-06-29
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公开(公告)号： US11143968B2公开(公告)日： 2021-10-12
- 发明人: Daniel Jozef Maria Direcks , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
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