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Patent Agency Ranking
公开(公告)号：US09465302B2
公开(公告)日：2016-10-11
申请号：US14704384
申请日：2015-05-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus Van Den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
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公开(公告)号：US11143968B2
公开(公告)日：2021-10-12
申请号：US15196120
申请日：2016-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Daniel Jozef Maria Direcks , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Danny Maria Hubertus Philips , Michel Riepen , Clemens Johannes Gerardus Van Den Dungen , Adrianes Johannes Baeten , Fabrizio Evangelista
IPC: G03F7/20
Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
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公开(公告)号：US10649341B2
公开(公告)日：2020-05-12
申请号：US15287524
申请日：2016-10-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus Van Den Dungen , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
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公开(公告)号：US20150034788A1
公开(公告)日：2015-02-05
申请号：US14382228
申请日：2013-01-30
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan Bleeker , Thomas Josephus Maria Castenmill , Pieter Willem Herman De Jager , Heine Melle Mulder , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beere , Roger Anton Marie Timmermans
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/20 , G03F7/7005 , G03F7/70075 , G03F7/70275 , G03F7/70291 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70475
Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.
Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止在由可旋转框架保持的镜片上施加力矩。
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公开(公告)号：US20170023870A1
公开(公告)日：2017-01-26
申请号：US15287524
申请日：2016-10-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus Koppelaars , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Marcel Beckers , Richard Moerman , Cédric Désiré Grouwstra , Danny Maria Hubertus Philips , Remko Jan Peter Verhees , Pieter Mulder , Evert Van Vliet
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70866
Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。
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